High Purity Titanium Silicide TiSi2 Powder CAS 12039-83-7, 99.5%

The Titanium Silicide TiSi2 Pulver:
Large integrated circuits are rapidly developing (ULSI). As a result, equipment sizes and requirements have become smaller.
The wire width of the current semiconductor device is now less than 0.1mm. Therefore, it’s impossible to get a continuous conductor that has a low resistance.
For circuit metallization improvement or replacement, we need new materials, processes and deposition systems.
Metal silicon with high conductivity, high temperature stability, and metal silica has been gaining increasing attention. This is compatible to the microelectronic manufacturing process. Disilicide for Titanium Has low resistance and high temperatures. Good stability.
Commonly studied metal silicide This includes TiSi2 Nisi, Cosi2, WaSi2, TaSi2, MOSi2) silicide (TiSi2) is ideal because it has high conductivity and high selectivity. It also exhibits good thermal stability. Si Adsorption and good process adaptation. In the integrated circuit device this is also possible. TiSi2 titanium silicide This is widely used for the production of a metallic oxide semiconductor (MOS), MOSFET (MOSFET), and dynamic random access memory.

To receive the most current information, send us an inquiry titanium disilicide price You can buy here Titanium Silicide TiSi2 Puffer In bulk.

Titanium Silicide TiSi2 Pulver Characteristics:
This titanium silicide TiSi2 Powder (CAS 12039-83-7) has a high melt point, high corrosion resistance. high oxidation resistance.

Technical Parameters of Titanium Siicide TiSi2 Pulp:

Product Name	MF	Purity	Particle Size	Melting Point	Density	The color of the sky
Titanium silicide	TiSi2	99%	5-10um	1620	4.0 g/cm3	black

Titanium Silicide TiSi2 Pulp:

TiSi2	Ti	Si	C	P	Fe	S
>99%	46.32%	52.5%	0.02%	0.02%	0.19%	0.01%

Molybdenum siicide: MoSi2 Is powder produced?
You can make di silicide by reacting titanium with hydride or silicon.
Ti +2 Si – Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
Reacting with titanium tetrachloride can be used to produce silane, dicloronilane and silicon.
TiCl4 +2 SiH4 — Tisi2 +4 HCl+2 H2
TiCl4 + 2 SiH2Cl2+ 2 H2 — Tisi2+ 8 HCL
TiCl4+3 Si – Tisi2+ SiCL4

Applicaciones Molybdenum Silicide MoSi2 Powder:
In the semiconductor industry, titanium silicide is utilized. The sheet resistance of the local transistor connections is reduced by growing it using the salicide technique over silicon and polysilicon. It is used most often in the C54 Phase of microelectronics.
1. Silicide Titanide’s melting point and low cost are high. The chemical properties of Silicide Titanide make it a versatile material with many applications in the field of microelectronics.
2. Aerospace Industry, Ship Submarine Manufacturing, Medical, Jewelery Manufacturing.

Packing and Shipping Titanium Silicide Powder TiSi2 Powder
The amount of titanium silicide TiSi2 powder can determine the type of packing we offer.
Packaging of TiSi2 titanium silicide powder You can vacuum pack 100g, 500g, 1kg/bag or 25kg/barrel. Or as you request.
Powder shipping of Titanium silicide TiSi2 Could be sent by sea or air as soon as possible after receipt of payment.


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High-quality products are what you want TiSi2 powder Please feel free and contact us to send an enquiry. (brad@ihpa.net)