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Titanium Silicide, Ti5Si3, has excellent characteristics. The silicate is extremely versatile with its high melting point of 2 403 K, low density (4.32g/cm3) low resistance (50 –120mO*cm), high hardness (968 V), and high temperature endurance.
Purity: 99%
Particle size 5-10um
The Titanium Silicide Ti5Si3 Pulver:
HTML5Si3 exhibits good high-temperature stability and high-temperature resistance. Following is the sintering procedure: Mix Si powder with Ti powder, heated to 1350-1450. Heat preservation. Once the furnace has cooled to room temperature, the sintered materials are added to the anhydrousethanol. Finally, the sealed container is inserted into the high energy planetary ball mill. (Wet ball-mill refinement is possible using AR gas.) After drying, the Ti5Si3 slurry was ground by passing through a 130-mesh sieve.
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Product Performance of Titanium Silicide Ti5Si3 Powder:
Titanium Silicide, Ti5Si3, has excellent characteristics. The silica has very good characteristics. It is low in density (4.3 g/cm3), high melting points (2403 K), low resistivity (50-120cm), high hardness (968HV), and excellent resistance to heat oxidation.
Technical Parameters of Titanium Silicide Powder Ti5Si3:
Product name |
MF |
Purity |
Particle Size |
Molecular mass |
Density |
|
Titanium Siicide |
Ti5Si3 |
99% |
5-10um |
323.59 |
4.39 g/cm3 |
black |
Chemical composition of Titanium Silicide Ti5Si3 Puffer:
Ti5Si3 |
Ti |
Si |
|
|
Si |
Mg |
Fe |
99% |
73.6% |
26.1% |
0.012% |
0.07% |
0.006% |
0.001% |
0.12% |
How Titanium Silicide Si5Si3 Pu Is it Produced?
Ti5Si3 may be prepared in a number of ways. These include casting method or powder sintering process, rapid solidification technique, self-propagating ignition method and so forth. However, these techniques can be prone to pollution due to their complex processing technology and low yield.
1. The invention is about a method to prepare trisilicate Pentatitanium intermetallic compound paste in a batch. This process includes the following steps.
(1) Ti5Si3 was made by vacuum-sintering. It is composed of Si and Ti powders at a 3:5 molar ratio.
(2) Step 1: Place evenly-mixed Si powder and T powder into a vacuum furnace. Then, heat the oven to 1350-1450. Cool the furnace at room temperature.
(3) After preparing the sintered materials in step 2, anhydrousethanol was added to them and they were then placed into a tank. This sealed tank was placed in an AR gas-protected high-energy planetary mill. It then went through the dry ball mill process.
(4) Ball milling slurry from Step 3 was vacuum dried, ground and powdered into Ti5Si3 by using a 130 mesh sieve.
2. This batch preparation method is for trisilicate intermetallic powder. It is described in Claim 1 as having the characteristic that the vacuum level of vacuum furnace used in step (2) is below 1.010-2Pa.
3. Following the batch method for the preparation of trisilicate intermetallic compounds powder, as claimed in claim 1, these characteristics are: The temperature at 1350-1450 is reached at 20/min. It’s then held at that temperature for between 3-5 hours.
4. In claim 1, it is stated that batch preparation methods of trisilicate-intermetallic compound powder are described. The rotation speed of the planetary balls mill is from 300 to 500 RPM in step 3. Ball grinding takes 24-48 hours.
This batch method is for the preparation of trisilicate Penta–titanium intermetallic compounds powder according to the following molar ratio: 3:5 weighing Si and Ti powders as raw materials. After heating to 1350-1450 degrees, heat preservation and cooling, the mixture is transferred to a vacuum tank. (With AR gas as a protective gases, the tank is sealed into the high-energy planetary ball mill. Wet milling method was used to refine the material.) Ti5Si3 was then a 130 mesh sieve This process eliminates many defects, such as the melting casting method or powder pressing sintering methods, rapid solidification technique and self spreading combustion method. These are difficult to clean up, have low yields, high processing technology, and can easily cause pollution. High purity, zero byproducts. The process can control the stoichiometric proportion of products.
Titanium Silicide T5Si3 Ti3 Powder HTML3_ :
Ti5Si3 titanium silicide is widely used for the manufacturing of MOS, MOSFET, and DRAM gates. Source/drain interconnects with ohmic contacts.
Packing & Shipping Titanium Silicide Powder Ti5Si3:
There are many options for packing, which all depend on the amount of titanium silicide Si3 powder.
Packing of Titanium Silicide Ti5Si3 Powder: vacuum Packaging, 100g to 500g or 1kg/bag 25kg/barrel. Or as requested.
Shipping Titanium Silicide Ti5Si3 Powder: could send out via sea, air or express once the payment has been received.
Lempotee Nano Technology Co. Ltd.
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Titanium Silicide Properties
|
Pentatitanium trisilicide |
12067-57-1 |
|
Ti5Si3 |
Molecular Weigh |
323.59 |
Appearance |
Grey Black Powder |
Melting Point |
N/A |
Heating Point |
N/A |
Density |
4.39 g/cm3 |
Solubility of H2O |
N/A |
Exact |
323.670515 |
Titanium Silicide Information Health & Safety
|
N/A |
Hazard Statements |
N/A |
Hazard Codes |
N/A |
Risk Codes |
N/A |
Security Statements |
N/A |
Transport Information |
N/A |
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